Euv Source Technology - Nanotechnology

Relevant Publications

Exposure latitude aware source and mask optimization for extreme ultraviolet lithography.

Issue Release: 2021

Source mask optimization for extreme-ultraviolet lithography based on thick mask model and social learning particle swarm optimization algorithm.

Issue Release: 2021

Fast heuristic-based source mask optimization for EUV lithography using dual edge evolution and partial sampling.

Issue Release: 2021

High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results.

Issue Release: 2020

Coherent Tabletop EUV Ptychography of Nanopatterns.

Issue Release: 2018

Fast resist-activation dosimetry for extreme ultra-violet lithography.

Issue Release: 2017

Synthesis of arbitrary pulse waveforms in QCL-seeded ns-pulse CO₂ laser for optimization of an LPP EUV source.

Issue Release: 2016

Single spherical mirror optic for extreme ultraviolet lithography enabled by inverse lithography technology.

Issue Release: 2014

Full field analysis of critical dimension uniformity due to focal variation for contact features in extreme ultraviolet lithography.

Issue Release: 2014

Time exposure performance of Mo-Au Gibbsian segregating alloys for extreme ultraviolet collector optics.

Issue Release: 2008

New laser plasma source for extreme-ultraviolet lithography.

Issue Release: 1995

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