Etching Processes - Nanotechnology

What is Etching in Nanotechnology?

Etching is a critical process in nanotechnology that involves removing layers from the surface of a material to create precise patterns and structures. This process is essential for manufacturing nanoscale devices such as semiconductors, MEMS, and nanowires.

Types of Etching Processes

There are two main types of etching processes: wet etching and dry etching. Each has its advantages and limitations depending on the specific application.

Wet Etching

Wet etching involves using liquid chemicals to dissolve specific materials. The primary advantage is its simplicity and cost-effectiveness. However, it often lacks the precision required for nanoscale structures and can lead to undercutting.

Dry Etching

Dry etching uses gases or plasmas to remove material. It can be further categorized into physical etching, chemical etching, and reactive ion etching (RIE). Dry etching offers higher precision and better control over the etching profile, making it more suitable for nanoscale fabrication.

Reactive Ion Etching (RIE)

RIE is a widely used dry etching technique in nanotechnology. It combines both physical and chemical etching mechanisms to achieve high precision and anisotropic etching profiles. This makes it ideal for creating complex nanostructures.

Challenges in Etching

One of the significant challenges in etching for nanotechnology is achieving high selectivity and anisotropy. Selectivity refers to the ability to etch one material without affecting another, while anisotropy ensures vertical etching without undercutting. Balancing these parameters is crucial for successful nanoscale fabrication.

Applications of Etching in Nanotechnology

Etching processes are fundamental in various nanotechnology applications, including the fabrication of integrated circuits, sensors, and nanostructured materials. These applications benefit from the high precision and control offered by advanced etching techniques.

Future Directions

As nanotechnology continues to evolve, etching processes must adapt to meet the increasing demand for smaller, more complex structures. Innovations in etching technologies and materials will play a crucial role in advancing the capabilities of nanoscale fabrication.

Relevant Publications

Formation of {111} oriented domains during the sputtering epitaxy growth of (001) oriented Iridium films.

Issue Release: 2024

Effective radioactive strontium removal using lithium titanate decorated TiCT MXene/polyacrylonitrile beads.

Issue Release: 2024

Direct in-situ imaging of electrochemical corrosion of Pd-Pt core-shell electrocatalysts.

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A Review of Plasma-Synthesized and Plasma Surface-Modified Piezoelectric Polymer Films for Nanogenerators and Sensors.

Issue Release: 2024

A Comprehensive Study of NF-Based Selective Etching Processes: Application to the Fabrication of Vertically Stacked Horizontal Gate-All-around Si Nanosheet Transistors.

Issue Release: 2024

Metal-assisted chemical etching beyond Si: applications to III-V compounds and wide-bandgap semiconductors.

Issue Release: 2024

Wet Etching of Silicon in Planar Nanochannels.

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The Effect of Height Error on Performance of Propagation Phase-Based Metalens.

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Monodispersed Bubble Generation Using Hydrophobic Orifices: The Extended Tate\'s Law.

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Low-loss grating coupler with a subwavelength structure on a thin-film lithium niobate substrate.

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Ultrasensitive Detection of PSA Using Antibodies in Crowding Polyelectrolyte Multilayers on a Silicon Nanowire Field-Effect Transistor.

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Graphene removal by water-assisted focused electron-beam-induced etching - unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO substrates.

Issue Release: 2024

Michaelis-Menten kinetics during dry etching processes.

Issue Release: 2024

Low-cost and convenient fabrication of polymer micro/nanopores with the needle punching process and their applications in nanofluidic sensing.

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The Effects of Etchant on via Hole Taper Angle and Selectivity in Selective Laser Etching.

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Design of Etched- and Functionalized-Halloysite/Meloxicam Hybrids: A Tool for Enhancing Drug Solubility and Dissolution Rate.

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Batch Fabrication of Microelectrode Arrays with Glassy Carbon Microelectrodes and Interconnections for Neurochemical Sensing: Promises and Challenges.

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Layer-by-layer thinning of two-dimensional materials.

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Electron beam lithography on nonplanar and irregular surfaces.

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SERS-based detection of the antibiotic ceftriaxone in spiked fresh plasma and microdialysate matrix by using silver-functionalized silicon nanowire substrates.

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