Deep Ultraviolet (duv) Lithography - Nanotechnology

Relevant Publications

Aqueous Developable and CO2-Sourced Chemical Amplification Photoresist with High Performance.

Issue Release: 2024

All-Glass 100 mm Diameter Visible Metalens for Imaging the Cosmos.

Issue Release: 2024

Wet cleaning of Ta-based extreme ultraviolet photomasks at room temperature.

Issue Release: 2024

A Review of Emerging Technologies in Ultra-Smooth Surface Processing for Optical Components.

Issue Release: 2024

Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems.

Issue Release: 2024

Additive-Assisted Forming High-Quality Thin Films of Sn-Oxo Cluster for Nanopatterning.

Issue Release: 2024

High-efficiency dual single layer graphene modulator integrated on slot waveguides.

Issue Release: 2023

Emulation of deep-ultraviolet lithography using rapid-prototyping, electron-beam lithography for silicon photonics design.

Issue Release: 2023

Molecular Layer Deposition of a Hafnium-Based Hybrid Thin Film as an Electron Beam Resist.

Issue Release: 2022

Enhancing deep-UV emission at 234 nm by introducing a truncated pyramid AlN/GaN nanostructure with fine-tuned multiple facets.

Issue Release: 2022

GaAs nanowires on Si nanopillars: towards large scale, phase-engineered arrays.

Issue Release: 2022

Understanding the Exposure Process in the Extreme Ultra Violet Lithography.

Issue Release: 2021

Lithographic Performance of Aryl Epoxy Thermoset Resins as Negative Tone Photoresist for Microlithography.

Issue Release: 2020

Nanosecond laser-induced surface damage and its mechanism of CaF optical window at 248 nm KrF excimer laser.

Issue Release: 2020

All-Glass, Large Metalens at Visible Wavelength Using Deep-Ultraviolet Projection Lithography.

Issue Release: 2019

Ultra-sharp asymmetric Fano-like resonance spectrum on Si photonic platform.

Issue Release: 2019

Designing an Excellent Deep-Ultraviolet Birefringent Material for Light Polarization.

Issue Release: 2018

Deep Ultraviolet Copper(I) Thiocyanate (CuSCN) Photodetectors Based on Coplanar Nanogap Electrodes Fabricated via Adhesion Lithography.

Issue Release: 2017

300-mW narrow-linewidth deep-ultraviolet light generation at 193 nm by frequency mixing between Yb-hybrid and Er-fiber lasers.

Issue Release: 2015

Gradient-based inverse extreme ultraviolet lithography.

Issue Release: 2015

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